From wafers to apps, Leti has been the moving force behind all things SOI for over 30 years. Now they’re the powerhouse behind the FD-SOI phenomenon. CEO Marie-Noelle Semeria shares her insights here in part 2 of this exclusive ASN interview as to what Leti’s doing to drive the ecosystem forward. (In part 1, she shared her insights into what makes Leti tick – if you missed it, you can click here to read it now.)
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ASN: In which areas do you see SOI giving designers an edge?
MS: There is an advantage in terms of cost and power, so it’s attractive for IoT, for automotive, and more and more for medical devices. We see the first products in networks, in imaging, in RF. The flexibility of the design, thanks to the back bias gives another asset in terms of integration and cost. We consider that 28nm FD-SOI and 22nm FD-SOI are the IoT platforms, enabling many functions required by IoT applications. It’s a very exciting period for designers, for product managers, for start-ups. You can imagine new applications, new designs, and take advantage of engineered substrates combined with planar FD-SOI CMOS technology and 3D integration strategies to explore new frontiers.
ASN: What is Leti doing moving forward?
MS: Our commitment is to create value for our partners. So what is key for SOI now is to extend the ecosystem and to catch the IoT wave, especially for automotives, manufacturing and wearables. That’s why we launched the Silicon Impulse Initiative (SII) as a single entry gate providing access to FD-SOI IP and technology. SII is a consortium, gathering Soitec, ST, CMP, Dolphin and others, in order to beef up the EDA and design ecosystems. Silicon Impulse offers multi-project wafer runs (MPWs) with ST and GF as foundries based on a full portfolio of IPs. SII is setting up the ecosystem to make FD-SOI technology available for all the designers who have IP in bulk or in FinFET. To reach designers, we have set up events close to international conferences like DAC and VLSI, and we promote SII together with the SOI Consortium in San Francisco, Taiwan, Shanghai, Dresden….
The second way we are accelerating the deployment of FD-SOI technology in manufacturing is to provide our expertise to the companies who made the choice for FD-SOI technology. Leti assignees are working in Crolles with ST and in Dresden with GF to support the development of the technology and of specific IP such as back bias IP. The design center located in the Minatec premises is also open to designers who want to experiment with FD-SOI technology and have access to proof in silicon.
ASN: What role does Leti play in the SOI roadmap?
MS: The role of Leti is to pioneer the technology, to extend the ecosystem and to demonstrate in products the powerful ability of FD-SOI to impact new applications. Leti pioneered FD-SOI technology about 20 years ago. Soitec is a start-up of Leti, as well as SOISIC (which was acquired by ARM) in design. We developed the technology with ST, partnering with IBM, TI and universities. Now we’ve opened the ecosystem with GlobalFoundries and are considering new players. With the Silicon Impulse Initiative we are going a step further to open the technology to designers in the framework of our design center. We have had a pioneering role. Now we have to play a catalyst role in order to channel new customers toward FD-SOI technology and to enable new products.
Leti demonstrates that the FD-SOI roadmap can be expanded up to 7nm with huge performance taking advantage of the back biasing. Leti’s role is to transform the present window into a wide route for numerous applications requiring multi-node generations of technologies.
ASN: Is Silicon Impulse strictly FD-SOI, or do you have photonics, MEMS, RF-SOI…?
MS: We started with FD-SOI at 28nm because it’s available: it’s here. But as soon as the full EDA-IP ecosystem is set-up, this will be open for sure to all the emerging technologies: embedded memory (RRAM, PCM,MRAM…), 3D integration (CoolCube, Cu/Cu), imaging, photonics, sensors, RF, neuromorphic technology, quantum systems….which are developed in Leti. Having access to a full capability of demonstrations in a world class innovation ecosystem backed by a semiconductor foundry and a global IP portfolio leverages the value of SII.
ASN: Can you tell us about the arrangement with GlobalFoundries for 22nm FD-SOI? How did that evolve, and what does it mean for the ecosystem?
MS: Yes, last month we announced that we have joined GlobalFoundries’ GlobalSolutions ecosystem as an ASIC provider, specifically to support their 22FDX™ technology platform. We have worked with GlobalFoundries over the years in the frame of the IBM Alliance pre-T0 program..
In joining the GlobalSolutions ecosystem, Leti’s goal is to ensure that GF’s customers – chip designers – get the very best service from FD-SOI design conception through high-volume production. This has been in the works for a while. At the beginning of 2015, we sent a team to GlobalFoundries’ Fab 1 in Dresden to support ramp up of the platform. And now as an ecosystem partner, Leti will help their customers with circuit-design IP, including fully leveraging the back-bias feature, which will give them exceptional performance at very low voltages with low leakage.
We will be able to help a broad range of designers use all the strengths that FD-SOI brings to the table in terms of ultra-low-power and high performance, especially in 22nm IoT and mobile devices. It really is a win-win situation, in that both our customer bases will get increased access to both our respective technologies and expertise. It’s an excellent example of Leti’s global strategy.
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(This concludes part 2 of 2 in this Leti interview series. In part 1, Marie Semeria shared her insights into what makes Leti tick – if you missed it, you can click here to read it now.)
Now in its third year, the 2015 IEEE S3S Conference has evolved into the premier venue for sharing the latest and most important findings in the areas of process integration, advanced materials & materials processing, and device and circuit design for SOI, 3D and low-voltage microelectronics. World-class leading experts in their fields will come to this year’s S3S Conference to present, discuss and debate the most recent breakthroughs in their research.
This year’s program includes:
The conference also features several events tailored for socialization and peer-to-peer discussions, such as the welcome reception, the cookout and the interactive Poster & Reception Session which is a great place to meet new colleagues and learn and exchange insights on technical topics. Enjoy a light snack and a beverage of your choice while meandering around to meet and discuss technical issues with long-time colleagues and make connections with new and influential experts and decision makers in your field.
Take time to visit the local attractions of Sonoma County. Sonoma is well known for outdoor recreation, spas, golf, night life, shopping, culinary activities, arts and music and wineries. It is truly my pleasure to serve as the General Chair of the 2015 Conference. —Bruce Doris
Download the Advance Program
Find all the details about the conference on our website: s3sconference
Click here to go directly to the IEEE S3S Conference registration page.
Click here for hotel information. To be sure of getting a room at the special conference rate book before 18 September 2015.
The DoubleTree by Hilton Sonoma Wine Country, One Doubletree Drive, Rohnert Park, CA 94928
October 5th thru 8th, 2015
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The 2014 IEEE SOI-3DI–Subthreshold (S3S) Microelectronics Technology Unified Conference will take place from Monday October 6 through Thursday October 8 in San Francisco.
Last year we entered into a new era as the IEEE S3S Conference. The transition from the IEEE International SOI Conference to the IEEE S3S conference was successful by any measurement. The first year of the new conference leading-edge experts from 3D Integration, Sub-threshold Microelectronics and SOI fields gathered and we established a world class international venue to present, learn and debate about these exciting topics. The overall participation at the first year of the new conference grew by over 50%, and the overall quality and quantity of the technical content grew even more.
This year we are looking forward to continuing to enhance the content of the 2014 S3S Conference.
Short courses: Monolithic 3D & Power-Efficient Chip Tech
On Monday, Oct. 6 we will feature two Short Courses that will run in parallel. Short courses are an educational venue where newcomers can gain overview and generalists can learn more details about new and timely topics.
The short course on Monolithic 3D will be a full day deep dive into the topic of three-dimensional integration wherein the vertical connectivity is compatible with the horizontal connectivity (10,000x better than TSV). Already there are extremely successful examples of monolithic 3D Flash Memory. Looking beyond this initial application, we will explore the application of monolithic 3D to alternate memories like RRAM, CMOS systems with silicon and other channel materials like III V. In addition, a significant portion of the short course will be dedicated to the exciting opportunity of Monolithic 3D in the context of CMOS Logic.
The other short course we will offer this year is entitled Power Efficient Chip Technology. This short course will address several key aspects of power-efficiency including low power transistors and circuits. The course will also review in detail the impact of design and architecture on the energy-efficiency of systems. The short course chairs as well as the instructors are world class leading experts from the most prestigious industry and academic institutions.
The regular conference sessions will start on Tuesday Oct. 7 with the plenary session, which will feature presentations from Wall Street (Morgan Stanley Investment Banking), Microsoft and MediaTek. After the plenary session we will hear invited talks and this year’s selection of outstanding papers from international researchers from top companies and universities. The most up to date results will be shared. Audience questions and one on one interaction with presenters is encouraged.
Back by popular demand we will have 2 Hot Topics Sessions this year. The first Hot Topic Session is scheduled for Tuesday Oct. 7th and will feature exciting 3DI topics. The other Hot Topics session is scheduled for Thursday Oct 9 and will showcase new and exciting work in the area of MEMS.
Our unique poster session and reception format will have a short presentation by the authors followed by one on one interaction to review details of the poster with the audience, in a friendly atmosphere, around a drink. Last year we had regular posters as well as several invited posters with very high quality content and we anticipate this year’s poster session to be even better than last years.
We are offering a choice of two different fundamentals classes on Wednesday afternoon. One of the Fundamentals classes will focus on Robust Design of Subthreshold Digital and Mixed Circuits, with tutorials by the worlds leading experts in this field. The SOI fundamentals course is focused on RF SOI Technology Fundamentals and Applications.
Our technical content is detailed on our program webpage.
Panel discussions, cookout & more
Keeping in line with tradition, on Wednesday night we will have a hearty cook out with delicious food and drink followed by the Panel Session entitled Cost and Benefit of Scaling Beyond 14nm. Panel speakers from financial, semiconductor equipment, technology, and academic research institutions will gather along with the audience to debate this timely topic. Although Thursday is the last day of the conference we will have stimulating presentations on novel devices, energy harvesting, radiation effects along with the MEMS Hot Topic Session and Late News Session. As always we will finish the conference with the award ceremony for the best papers.
Our conference has a long tradition of attracting presenters and audience members from the most prestigious research, technology and academic institutions from around the world. There are many social events at the S3S Conference as well as quiet time where ideas are discussed and challenged off line and people from various fields can learn more about other fields of interest from leading experts.
The conference also offers many opportunities for networking with people inside and also outside ones area. The venue this year is San Francisco. We chose this location to attract the regions leading experts from Academia and Industry. If you have free time we encourage you to explore San Francisco which is famous for a multitude of cultural and culinary opportunities.
To take full advantage of this outstanding event, register before September 18!
Special hotel rates are also available from the dedicated hotel registration page.
The committee and I look forward to seeing you in San Fransisco.
– Bruce Doris, S3S General Chair
The following in-depth analysis, an IBS study entitled How FD-SOI will Enable Innovation and Growth in Mobile Platform Sales, concludes that the benefits of FD-SOI are overwhelming for mobile platforms through Q4/2017 based on a number of key metrics. In fact, FD-SOI has the ability to support three technology nodes, which can mean a useful lifetime through 2020 and beyond for digital designs and through 2030 for mixed-signal designs. Here are some of the highlights from the study.
First, let’s consider the markets we’re addressing.
The unit volume of smartphones and tablet computers is projected to reach nearly 3B units in 2020 worldwide. These mobile platforms need to have access to low-cost and low-power semiconductor products, including application processors and modems. Performance must also be enhanced, but this needs to be done within the cost and power consumption constraints.
Mobile platforms need essentially the same performance as notebook computers, but have to rely on much smaller battery capacity. They also need to support high-performance graphics and ever-greater data rates, including the support of 1Gbps when the 5G protocol is tested in 2018. Better cameras demands high-performance image signal processing. 3-D imaging, now under development, will require multiple image sensors. All of this needs to be accommodated with lower power consumption and lower cost.
It is significant that a high percentage of smartphones and tablet computers will be manufactured byChinese companies. Semiconductor technologies that increase battery lifetime without incurring additional costs or potentially providing lower cost can be very attractive to smartphone vendors.
The market requirements are clear, and our detailed analysis of various technology options, including bulk CMOS at 28nm and 20nm and FinFET at 16/14nm, shows FD-SOI is the best option for supporting the requirements of high-volume mobile platforms.
FinFETs have the potential to be in high volume in the future: the key issue is timing. Our analysis indicates that FinFETs have high design costs, along with high product costs. It is not realistic to expect FinFETs to be effective for the low-cost and low-power modems, application processors, and other processor engines for mobile platforms in 2016 and 2017.
FinFETs need to go through two phases in the 2015 to 2016 time frame to reach the point where they are suitable for low power and low cost applications.
In the first phase, they will be used in high-performance products such as processors for servers, FPGAs, graphics accelerators, and other similar product categories. This approach was used in the past for new-generation process technologies, where price premiums were obtained from the initial products. The time frame for the high-performance phase of 16/14nm FinFETs within the foundry environment can be 2015, 2016, and potentially 2017.
The high-performance phase can allow extensive characterization of the 16/14nm process and provide a good understanding of various categories of parasitic so that product yields can become high. There is also the need to establish design flows so that new products can be brought to the market within short design windows. The high priced product phase can position 16/14nm FinFETs to be potentially used in high volume, low cost products at a future time.
The second FinFET phase comprises the ramp-up to high volumes for high end processor engines for mobile platforms. High-end mobile platforms, including tablet computers and smartphones, can provide relatively high volumes for FinFET products if costs are competitive. Modems, application processors, and graphics functionality will be suited to the 16/14nm FinFETs from the foundries in the 2017 to 2018 time frame.
This type of methodical approach in solving the manufacturing challenges at 16/14nm can be applied to 10nm and 7nm FinFETs. There is the need to establish design flows that can yield high gate utilization as well as the ability to obtain high parametric yields. The time frame for the high-volume, low-cost phase of FinFETs can potentially be 2017 or 2018.
With the delays in ramping 16/14nm FinFETs into high volume until potentially 2017 or 2018, an alternate technology is needed to support the next phase of the mobile platform IC product supply, which can give low power consumption and low cost.
FD-SOI: Competitive Positioning
To provide visibly into the options for technology selection, IBS has analyzed projected wafer costs and gate costs for bulk CMOS, FD-SOI, and FinFETs. Considerations include processing steps, masks, wafer costs, die shrink area, tool depreciation and parametric yield. The results are shown in the following figures.
Processed wafer cost comparison for FD-SOI, bulk CMOS and bulk FinFETs at the 28nm through 16/14nm nodes. (Source: IBS)
Gate cost comparison for FD-SOI, bulk CMOS and bulk FinFETs at the 28nm through 16/14nm nodes. (Source: IBS)
The low cost per gate of 28nm wafers in Q4/2016 and Q4/2017 allows this technology node to have a long lifetime. The performance of 28nm FD-SOI is 30% higher compared to 28nm bulk CMOS, with leakage also being 30% lower. There are, consequently, significant benefits in using 28nm FD-SOI compared to 28nm bulk CMOS for the high volume cost- and power-sensitive applications.
Furthermore, the performance of 28nm FD SOI is 15% better than 20nm bulk CMOS, giving 28nm FD-SOI a potentially even longer lifetime.
The gate cost of 20nm FD-SOI is 20% lower than 20nm bulk CMOS, while offering 40% lower power. and 40% higher performance. The higher cost per gate of 20nm bulk CMOS compared to 20nm FD-SOI is due to the higher number of processing and masking steps. There are also parametric yield penalties at 20nm because of difficulties in controlling leakage. Fabless companies that choose 20nm bulk CMOS over 20nm FD-SOI (called 14nm by STMicroelectronics) risk to find themselves with a noncompetitive platform.
14nm FD-SOI (called 10nm by STMicroelectronics) has an almost 30% lower cost per gate than 14nm FinFETs (including 16nm FinFETs) in Q4/2017, which is a major advantage in price-sensitive applications. Power consumption and performance are expected to be comparable between two technologies.
Why the hesitation in using FD-SOI?
While we clearly see that the benefits of FD-SOI, we also recognize that there is an expectation in the semiconductor industry that Intel sets the bar, so if Intel is doing FinFETs, everyone else should, too. The financial metrics of Intel are, however, different from those applicable to the fabless-foundry ecosystem. Intel is obtaining large revenues from its data center processors. And even though the company has promoted its 14nm and Tri-Gate processors for mobile platforms, Intel’s success in this arena has not been outstanding to date. Intel has, however, delayed the high-volume production of its 14nm Tri-Gate from Q4/2013 to H1/2015 because of low yields. The yield challenges that Intel is experiencing at 14nm should be a warning to fabless-foundry companies of the difficulties in ramping 16/14nm FinFETs within relatively short time frames.
Nonetheless, the manufacturing ecosystem is committed to making FinFET successful, so the resources that have been committed to FD-SOI have been limited. There is also reluctance to admit that the decision to adopt FinFET was premature and a thorough analysis of the cost penalties was not done. A similar perspective applies to 20nm bulk CMOS in following the industry pattern for not having a thorough review of the cost and performance impact.
FD-SOI for High-Volume Applications
The benefits of FD-SOI are clear, and as the yield and cost problems related to 20nm bulk CMOS and 16/14nm FinFETs become clearer, it is expected that there will be increased momentum to adopt FD-SOI at 28nm, 20nm (14nm by STMicroelectronics), and 14nm (10nm by STMicroelectronics).
To recap, FD-SOI provides the following benefits for high-volume mobile multimedia platforms:
At 28nm, 20nm, and 14nm technologies, IBS concludes that FD-SOI is superior to competitive offerings for smartphones and tablet computers, and the advantages of FD-SOI extend through Q4/2017. As the supply base for FD-SOI strengthens, FD-SOI is expected to become a key part of the semiconductor supply chain ecosystem for high-volume applications such as smartphones and tablet computers.
The ecosystem in the semiconductor industry should focus on the technologies that optimize the benefits for customers.
SOI-3D-Subthreshold Microelectronics Technology Unified Conference
6-9 October 2014
Westin San Francisco Airport, Millbrae, CA
Last year, the first edition of the IEEE S3S conference, founded upon the co-location of the IEEE International SOI Conference and the IEEE Subthreshold Microelectronics Conference was a great success with a 50% increase in attendance.
The conference will, this year again, hold two parallel sessions related to SOI and Subthreshold Microelectronics supplemented by a common session on 3D integration.
The 2014 edition of the conference already promises a rich content of high-level presentations.
The plenary session will host Alice Wang (MediaTek), Bruno Terkaly (Microsoft) and Mark Edelstone (Morgan Stanley Investment Banking). They will give us a broad overview of the new markets and opportunities for the upcoming years.
Invited speakers from major industries (like GlobalFoundries, SEH, ST, IBM, Rambus) and from many prestigious academic institutions will share with us their views of the ongoing technical challenges related to SOI, Sub-VT and 3D integration. The complete list of invited speakers can be seen on the program outline page of the conference website.
On the same webpage, more information is given about the various dedicated sessions.
There will be two short courses again this year: One on Power Efficiency, and the other on Monolithic 3D. There will also be a class on RF-SOI Technology Fundamentals and Applications as well as a fundamentals class on Robust Subthreshold Ultra-low-voltage Design of Digital and Analog/RF Circuits.
The Hot Topics session will, this year, be about MEMS. During the Rump session we will debate about the Cost and Benefit of Scaling Beyond 14nm.
The Committee will review papers submitted by May 26 in the three following focus areas of the conference:
Students are encouraged to submit papers and compete for the Best Student paper awards, sponsored by Qualcomm. Details on paper submission and awards are given on the call for paper webpage.
The 2014 edition of the conference will be very conveniently located in Millbrae, California, close to the San Francisco airport. The BART and Caltrain stations, within walking distance, give you access to San Francisco to the north and the Silicon Valley to the south. Conference attendants will be able to easily combine their trips with visiting colleagues in the Bay Area or touring the Golden City.
Paper submission deadline: 26 May 2014
Notification of acceptance: 23 June 2014
Short course date: 6 October 2014
Conference date: 6 – 9 October 2014
More details are available on the S3S website.
The new IEEE S3S conference promised rich content, as it merged both The IEEE International SOI Conference and the IEEE Subthreshold Microelectronics Conference, completed by an additional track on 3D Integration.
The result was an excellent conference, with outstanding presentations from key players in each of the three topics covered. This quality was reflected in the increased attendance: almost 50% more than at the SOI conference last year.
The new triptych at the heart of the conference was well illustrated by the plenary session, which combined a presentation on ST’s FD-SOI technology by Laurent LePailleur (STMicroelectronics), one on Low Power Design, by Bob Bordersen (UC Berkeley), and one on monolithic integration by Zvi Or-Bach (MonolithIC 3D™).
Professor Bordersen’s presentation dealt with power efficiency, explaining how developing dedicated units with a high level of parallelism and a low frequency can boost the number of operations performed for 1nJ of expanded power. He illustrated his point by showing how an 802.11a Dedicated Design for Computational Photography can reach 50,000 OP/nJ while an advanced quadcore microprocessor will not even reach 1 OP/nJ. Such is the price of flexibility….but the speaker claims this can be overcome by using reconfigurable interconnects.
The “Best SOI Paper” award went to a GlobalFoundries/IBM paper entitled “FinWidth Scaling for Improved Short Channel Control and Performance in Aggressively Scaled Channel Length SOI FinFETs.” The presenter, Abhijeet Paul (GF) explained how narrower Fins can be used to improve short channel effects while actually giving more effective current without degrading the on-resistance. (See the DIBL and SS improvement on the chart.)
The”Best SOI Student Paper” award went to H. Niebojewski for a detailed theoretical investigation of the technical requirements enabling introduction of self-aligned contacts at the 10nm node without additional circuit delay. This work by ST, CEA-Leti and IEMN was presented during the extensive session on planar FD-SOI that started with Laurent Grenouillet’s (CEA-Leti) invited talk. Laurent first updated us on 14nm FD-SOI performance: Impressive static performance has been reported at 0.9V as well as ROs running at 11.5ps/stage at the very low IOFF=5nA/µm (0.9V & FO3). Then he presented potential boosters to reach the 10nm node targets (+20% speed or -25% power @ same speed). Those boosters include BOX thinning, possibly combined with dual STI integration, to improve electrostatics and take full advantage of back-biasing as well as strain introduction in the N channel (in-plane stressors or sSOI) combined with P-channel germanidation.
sSOI (strained SOI) was also the topic of Ali Khakifirooz’ (IBM) late news paper, who showed how this material enables more than 20% drive current enhancement in FinFETs scaled at a gate pitch of 64nm (at this pitch, conventional stressors usually become mostly inefficient).
An impressive hot topics session was dedicated to RF CMOS.
J. Young (Skyworks) explained the power management challenges as data rates increase (5x/3 years). Peak power to average power ratio has moved from 2:1 to 7:1 while going from 3G to LTE. Advanced power management techniques such as Envelope Tracking can be used to boost your system’s efficiency from 31% to 41% when transferring data (compared to Average Power Tracking techniques), thus saving battery life.
Paul Hurwitz (TowerJazz) showed how SOI has become the dominant RF switch technology, and is still on the rise, with predictions of close to 70% of market share in 2014.
The conference also had a strong educational track this year, with 2 short courses (SOI and 3DI) and 2 fundamentals classes (SOI and Sub-Vt).
The SOI short course was actually not SOI-restricted, since it was addressing the challenges of designing for a new device technology. P. Flatresse (ST) and T. Bednar (IBM) covered the SOI technology parts (FD-SOI and SOI FinFETs for ASICs respectively), while D. Somasekhar (Intel) gave concrete examples of how the change of N/P performance balance, the improvement of gate control or the introduction of Mandrels has affected design. Other aspects were also covered: Design for Manufacturing (PDF), IP librairies (ARM) and design tools (Cadence) for the 14nm node, to make this short course very comprehensive.
The rump session hosted a friendly discussion about expectations for the 7nm node. It was argued that future scaling could come from 3DI, either through the use of monolithic 3D integration or stacking and TSVs because traditional scaling is facing too many challenges. Of course, 3DI may not yet be economically viable for most applications, and since it is compatible with traditional scaling, we might well see both developed in parallel.
3D integration was also the topic of another joint hot topics session covering various fields of investigation, like co-integration of InGaAs and Ge devices (AIST), or 3D cache architectures (CEA-Leti & List). A nice example was given by P. Batra (IBM) of two stacked eDRAM cache cores, where the 16Mb cache on one layer is controlled by the BIST on the other layer and vice-versa with the same efficiency as in the 2D operation.
The first edition of this new conference was very successful, with a good attendance, two sessions running in parallel, extensive educational tracks, a large poster session and a lot of very high quality content. The two hot topics sessions generated a lot of enthusiasm in the audience.
Similar sessions will be repeated at the conference’s next edition, in the San Francisco area. It promises to offer outstanding content once more, and we already urge you to plan to submit papers and attend it.
Last May, we already let you know about the IEEE S3S conference, founded upon the co-location of The IEEE International SOI Conference and the IEEE Subthreshold Microelectronics Conference, completed by an additional track on 3D Integration.
Today, we would like let you know that the advance program is available, and to attract your attention on the incredibly rich content proposed within and around this conference.
The conference revolves around an appropriate mix of high level contributed talks from leading industries and research groups, and invited talks from world-renowned experts.
The complete list of posters and presentations can be seen in the technical program.
This year some additional features have been added, including a joint session about RF CMOS as well as one about 3D integration. Check the list of participants on those links, and you will see that major players in the field are joining us!
Our usual rump session will let us debate what the 7 nm node and beyond will look like, based on the vision presented by our high profile panelists.
There will be 2 short courses this year, and 2 fundamentals classes. Those educational tracks are available to you even if you do not register for the full conference.
On Monday October 7th, you can attend the short course on “14nm Node Design and Methodology for Migration to a New Transistor Technology“, that covers specificities of 14nm design stemming from the migration of classical bulk to bulk to FinFET/FDSOI technologies..
Alternatively, on the same day you can attend the “3D IC Technology” short course, introducing the fundamentals of 3D integrated circuit technology, system design for 3D, and stress effects due to the Through Silicon Via (TSV).
On the afternoon of Wednesday October 9th, you can opt to follow the Sub Vt Fundamentals Class on “Robust subthreshold ultra-low-voltage design of digital and analog/RF circuits” or the SOI Fundamentals Class “Beyond SOI CMOS: Devices, Circuits, and Materials “.
You could also prefer to take the opportunity to visit the Monterey area.
The conference has always encouraged friendly interactions between the participants, and because it covers the complete chain, from materials to circuits, you are sure to meet someone from a field of interest. The usual social events, welcome reception, banquet and cookout dinner, will provide you with more openings for networking, contemplating new project opportunities or getting into technical discussions that could shed new light on your research.
To take full advantage of this outstanding event, register now!
Please visit our Hotel Registration Information page to benefit from our special discounted room rates at the conference venue, The Hyatt Regency Monterey Hotel and Spa.
The latest conference updates are available on the S3S website (http://S3Sconference.org).