Join us! In partnership with our members, the SOI Consortium is co-organizing and participating in two key SOI events coming up in China over the next few weeks. On May 18th, we’ve put together an SOI Forum at the World Semiconductor Congress (WCS) in Nanjing. And on May 23rd & 24th, we’ve teamed up with our members SIMIT, Sitri and Leti for another in our series of SOI Academies, including an FD-SOI Training Day. (The last one this past winter was a terrific success – read about that here if you missed our coverage at the time.)
At WCS, the SOI Forum (sub-forum #8) is part of the afternoon Innovation Summit. We’ll cover the broader SOI ecosystem, including both RF-SOI and FD-SOI – from wafers to design through manufacturing. Presentations will be given by members of the SOI Consortium team, and by leaders from our membership, including Simgui, NXP, Incize, ST, IBM, Cadence and Xpeedic. Click here or scan the QR code for the full program and registration information.
Also at WCS, SOI Consortium member VeriSilicon will be participating in a morning session on AI and IoT Wireless Communications (sub-forum #4). They’ll be giving a presentation on their low-power Bluetooth design platform for GlobalFoundries 22FDX, and their CEO Wayne Dai will be moderating a round-table discussion. You can get more information on that (in Chinese only, tho) here, or follow VeriSilicon on WeChat.
The SOI Academy in Shanghai is an opportunity for experienced designers to gain solid expertise in FD-SOI. The event begins in the afternoon of May 23rd with a series of informative plenary talks by members of the SOI Consortium team, and by experts from our members Leti, Soitec, VeriSilicon, GlobalFoundries and NXP. The FD-SOI Training starts the next morning, on May 24th.. This is a hands-on event lead by top experts from Leti. The morning is devoted to digital design in FD-SOI, and the afternoon to RF design (including for 5G) in FD-SOI. Attendees will get a comprehensive understanding of design techniques for low-power chips leveraging the multiple benefits and flexibility of FD-SOI technology. Get more information here, or from the WeChat QR code.
We’ve got a busy schedule! To keep up to date with where we and our members will be promoting the SOI ecosystem, be sure to check our Events page regularly.
Intento Design is working with STMicroelectronics to bring ID-XploreTM EDA software, which is aimed at solving the critical analog design challenges, to FD-SOI process nodes.
“ID-Xplore is a disruptive EDA software that accelerates analog design and migration processes by at least one order of magnitude. It reduces the cost and latency inherent to analog design. Currently, there is no similar EDA tool on the market covering the analog design challenges like ID-Xplore,” noted Dr. Ramy Iskander, CEO of Intento Design (see the press release here).
ST’s FD-SOI design expertise roots, of course, are as deep as they get. “ST’s decision to work with us confirms the relevance of our solution. We are very excited to work jointly with ST teams to take the most benefit out of FD-SOI technology leveraging ST’s pioneering leadership in this area,” continued Dr. Iskander.
“We’ve already seen the benefits of ID-Xplore in accelerating the design phase of different analog circuits, thanks to the software’s fast and accurate exploration capabilities in advanced FD-SOI processes,” said Thierry Bion, ST’s Hardware Design Director, Aerospace Defense & Legacy Division. “By facilitating IP reuse and sharing of design insights between engineers, ID-Xplore™ is helping our teams significantly accelerate new product introductions.”
ID-Xplore uses the OpenAccess database standard and is fully integrated within the Cadence design environment. The designer’s implicit and explicit knowledge is expressed as technology-independent constraints, bringing the designers back to their core expertise and creativity.
If you want to learn more, the folks over at semiwiki.com have made a number of posts on Intento Design recently. They’re really helpful in understanding what the company does, how and why:
CEO Interview: Ramy Iskander of Intento Design Edit (by Daniel Nenni) – good backgrounder on the company and product.
The Intention View: Disruptive Innovation for Analog Design Edit (by Daniel Nenni) – an excellent interview with Dr. Caitlin Brandon about how the tool works and how it aligns with and supports the way analog designers work.
A New Kind of Analog EDA Company Edit (by Daniel Payne) – Daniel Payne started his career as a circuit designer at Intel, and is now a well-known consultant/expert in the EDA world. Here he explores how ID-Xplore actually works and its “cool new automation features”.
That FD-SOI can be a key to achieving near-threshold voltage design was an important point made during a #55 DAC expert panel. Entitled How Close to Threshold-Voltage Design Can We Go Without Getting our Fingers Burnt? the session was organized by Jan Willis of Calibre Consulting. Turnout was excellent. Btw, Jan (herself an EDA expert) was one of the original advisors in the formation of the SOI Consortium, and while this DAC panel was not meant to be about FD-SOI, it turned out be a focal point.
Near-threshold voltage design* is an especially hot topic for IoT and edge-computing designers, for whom balancing performance, reliability and extremely low power is generally challenge #1. For them, the ability to get chips working at very low voltages translates into battery life savings.
The original goal of the panel was “…to explore how far below nominal voltage we can design, in what applications it makes sense and in what ways it will cost us.” The description in the #55 DAC program noted that “Energy consumption is the driving design parameter for many systems that must meet ‘always-on’ market requirements and in IoT in general. For decades, the semiconductor industry has attempted to leverage the essential principle that lowering voltage is the quickest, biggest way to reduce energy for a SoC. Some today contend sub-threshold voltage design is viable while others argue for near-threshold voltage design as the minimum.”
(Update 2 August 2018: a complete video of this panel is now available on YouTube — click here to view it.)
The panelists included:
Brian Fuller of Arm served as moderator.
Following the panel Jan published the following excellent recap on LinkedIn. She graciously agreed for it to be reprinted here in ASN, for which we thank her. So without further ado, read on!
First published on LinkedIn, June 27, 2018 by Jan Willis, Strategic Partnerships & Marketing Executive
Brian Fuller, Arm, skillfully guided a group of experts through the challenges of near-threshold design to conclude that the adoption is going to start gathering pace in a panel session at the 55th DAC in San Francisco on Monday, June 25.
Scott Hanson, CTO of Ambiq Micro, led off by saying the list of what’s not challenging is a much shorter list but that by taking an adaptive approach, they have been successful. It’s required innovating throughout the design process including test where Scott said they had create their own “secret sauce” to make it work. Later on in the panel, Scott described designers in near-threshold as “picojoule fanatics” to overcome the limitations in design tools which are geared towards achieving performance goals.
Lauri Koskinen, CTO of Minima Processor, agreed that adaptivity is key. Minima says it has to be done in situ in the design to make it robust for manufacturing while useful across more than one design. Later in the panel, Lauri indicated that FD-SOI is like having another knob available for optimizing energy in the Minima approach to near-threshold design.
Mahbub Rashed, head of Design and Technology Co-Optimization at GlobalFoundries, highlighted the need for more collaboration between EDA, IP, and foundries to support near-threshold design but noted a lot of progress has been made on FD-SOI processes. Mahbub cited models down to 0.4V for FD-SOI processes are available now and GlobalFoundries is able to guarantee yield.
Paul Wells, CEO of sureCore, validated that sureCore has bench marked their memories on GlobalFoundries FD-SOI with success. He reflected that FD-SOI has rapidly established itself as cost effective for a number of emerging markets. The panel all agreed that achieving quality on the memory at near-threshold voltage was much tougher than for digital IP. [Editor’s note: sureCore‘s CTO wrote an excellent summary of their SRAM IP for FD-SOI in ASN back in 2016 – you can still read it here.]
Paul went on to summarize at the end of the panel that near-threshold voltage is the way of the future and that it’s gathering pace. Mahbub called upon the EDA community to step up to improve the tools for low energy design. Lauri and Scott both summarized that there were drivers emerging that will grow the addressable market for near-threshold voltage design. Lauri pointed to growth coming from the applications that require edge computing which he thinks will require near-threshold voltage design. Scott concluded the panel by pointing out that there’s been a tremendous increase in performance of near-threshold voltage designs which will increase the addressable available market in the future.
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This piece was first published by Jan Willis on LinkedIn, June 27, 2018. Here is the original.
* As explained by Rich Collins of Synopsys in the TechDesign Forum: “Operating at near-threshold or sub-threshold voltages reduces static and dynamic power consumption, at the cost of design complexity. […] A transistor’s threshold voltage (Vth) is the voltage at which the transistor turns on. Most transistor circuits use a supply voltage substantially greater than the threshold voltage, so that the point at which the transistors turn on is not affected by supply variations or noise. […] In sub-threshold operation, the supply voltage is well below the Vth of the transistors. In this region, the transistors are partially On, but are never fully turned. Near-threshold operation happens between the sub-threshold region and the transistor threshold voltage Vth, or around 400 – 700mV for today’s processes.
EDA companies Cadence, Synopsys and Silvaco all gave excellent presentations at the SOI Consortium forums in Nanjing and Shanghai.
Here’s a recap of what the Cadence folks said. (I’ll cover the Synopsys and Silvaco presentations in my next posts.)
At the Shanghai FD-SOI Forum. Dr. Qui Wang, VP & Chief of Staff, talked about FD-SOI Foundry Enablement: From Concept to Mass Production. Cadence, he reminded the packed ballroom, is not just EDA, but also system design enablement targeting verticals. “We’re ready!” he stated.
In the last three years, they’ve done a lot of work on FD-SOI, he said, even working with ARM, GF and Dream Chip on the demo board as a reference design for automotive or vision applications, to show real data to their customers. It uses a quad implementation of the configurable Tensilica Vision P6 core.
To simplify back biasing for the library folks, they worked with the foundries to create interpolations. And as Cadence is traditionally strong in RF/mixed-signal, there’s a new back-biasing tool to simplify board-chip communications, and make the bridge between power and thermal analysis.
Jonathon Smith, Director of Strategic Alliances at Cadence, presented Enabling an Interconnected Digital World — Cadence EDA & IP Update at the Nanjing SOI summit. As he explained, his job is to ensure that design customers can use Cadence tools effectively, not just with Cadence IP, but also with 3rd party IP for the foundry nodes.
He pointed out that the numbers for IoT predictions vary widely, and that industrial IoT (IIoT) will probably account for about 10% of the market. What is sure is that it will contain a large mixed-signal component (RF/digital/analog) and complex packaging.
His customers want to know how fast and easy it is to work in FD-SOI. “Cadence custom and digital tools are ready for FD-SOI,” he said. They have the PDKs and tech files, and the EDA tools are enabled. The reference flows (both digital and custom analog) are tested and ready (Cadence customers who use p-cells and RF look especially for a good mixed-signal flow).
Customers also ask for proof points, and want to know the number of tape-outs they’ve done, performance benchmarks for working silicon and proven IP: this is what gives designers confidence, he said. Examples like Dream Chip’s Computer Vision Processor Chip Design for automotive ADAS CNN applications in 22nm FD-SOI (which they announced at Mobile World Congress in 2017 – see the press release here) have really helped build confidence further, he observed. (In case you missed it, DreamChip presented at the Silicon Valley SOI event in April 2017 – you can get that presentation here.)
Cadence sees SOI as a driving force in IoT markets. They’ve also had some big digital wins recently, he added, and have made some major announcements with the foundries.
For example, in September, they announced that their set of Design for Manufacturing (DFM) tools (signoff solutions) are now qualified on Samsung’s 28nm FD-SOI. This enables customers to create complex, advanced-node designs for the automotive, mobile, IoT, high-performance compute (HPC) and consumer markets (read the press release here). The Samsung Foundry’s PDKs for 28nm FD-SOI are available for download now and incorporate the Cadence Litho Physical Analyzer (LPA), Physical Verification System (PVS) and Cadence CMP Predictor (CCP). In addition to signoff quality, the Cadence DFM tools offer an integration with the Virtuoso® platform and the Innovus™ Implementation System, providing designers with automated fixing capabilities and overall ease of use.
And in October, Cadence announced that its digital and signoff flow, from synthesis to timing and power analysis, supports body-bias interpolation for GlobalFoundries 22FDX™ (read the press release here). The Cadence® tools enable advanced-node customers across a variety of vertical markets—including automotive, mobile, IoT and consumer applications—to use GF’s FD-SOI architecture to optimize power, performance and area (PPA).
Cadence tools for ST’s 28nm FD-SOI foundry process were ready in 2016, btw – there’s a nice video testimonial from ST on power signoff, for example, which you can see here.
The FD-SOI ecosystem is strong. This was made clear at the recent Tokyo SOI Workshop, organized by the SOI Consortium. The event was spread out over two days, and most of the presentations are now posted (click here to access them). To cover the full scope of the workshop will take (at least) a couple ASN posts. So let’s start with Day 1, which was billed as the “FD-SOI Ecosystem” day.
It kicked off with a full-house for an afternoon session in the Yokohama Landmark Tower hosted by Silvaco, with presentations from some of the key players in the FD-SOI Ecosystem.
David Sutton, CEO of EDA provider Silvaco opened the session with his talk, TCAD, EDA & IP to Support FD-SOI. Silvaco has deep FD-SOI roots, having supported Lapis Semi (formerly Oki) in its first forays into the technology – and that was back in 2002! The company is on a growth run this year, having acquired four companies, including IPextreme.
FD-SOI, he said, has been shown to be cost-effective. The capacity is in place, and it’s getting design wins. Silvaco’s full suite of EDA and custom CAD tools for FD-SOI cover the complete design flow from TCAD to sign-off. Their IP is very strong, he said, especially in automotive (including CAN IP), and their partnerships with key players like IBM and NXP are long running. In fact, Silvaco commercializes IP from NXP and others.
We got some great insights from Gregg Bartlett, GlobalFoundries’ SVP of the CMOS Business Unit, in his presentation FDX (FDSOI) Goes Mainstream – Roadmap for Product Competitiveness (it’s posted – click here to download it). “It is primetime for FD-SOI,” he said, and since one technology does not fit all, they’re redefining the mainstream. GF’s first FD-SOI offering, 22FDX, was qualified in March, and 12FDX will be taping out in the second half of 2018. They’ve currently got over 80 active engagements.
FD-SOI will be strong in China, he said. GF and the Chengdu municipality recently announced they are investing more than $100 million to build a world-class FD-SOI ecosystem including multiple design centers in Chengdu and university programs across China. This will lower the barriers to entry and increase IP availability even further, he said. They’re looking to put 500 design engineers in place. Customer tape-outs of 22FDX will begin at the new fab there in 2H2018, with volume production expected to start in 2019.
He went on to drill down on FDX applications, focusing on four main areas:
mobility: application processors that need high performance, RF integration and significant power reduction
IoT: this was the target when FDX was first conceived, and it continues to be a point of significant investment by the company
RF and mmWave: for BLE (Bluetooth Low Energy), WiFi, ZigBee and integrated PA’s (aka power amplifiers – where they’re seeing some impressive numbers, he said)
automotive: Grade 2 is done, and Grade 1 is underway (these are industry ratings related to reliability at the high-temperatures you get under the hood and in hotspots in the passenger compartment).
Citing a slide of customer testimonials, he concluded that the ecosystem is really starting to work, adding that they’ve got the right technology for the right applications, and it’s the right path for them to be on.
Invecas has been working on 22FDX since 2015 through a strategic partnership with GF. They’ve optimized IP and offer ASIC services, explained Bhaskar Kolla, the company’s Sr. Director of BizDev & Customer Engineering. His presentation, Invecas IP Portfolio in 22FDX is posted – click here to get it. It’s full of detail (standard cells, memories, analog & IO, and interface), so you’ll really want to check it out. The IPs are silicon proven and validated; the results are available, he said.
The foundation IPs are sponsored by GF, so they’re free to customers and cover a broad array of calibrations. They include forward and reverse body biasing (FBB and RBB) and body bias generator IP. Customers are really taking advantage of this, he said, citing as an example one that’s going for 2.5GHz by leveraging FBB.
Custom IP for analog & IO is a place they’re seeing a lot of interest, he continued, and on which they’re doing more and more work with clients. And their Interface IP is in a lot of silicon, especially for customers that are area sensitive. In fact, they’ve developed their own Interface IP demo platform in-house, from build through test and compliance checks.
In moving to FD-SOI, customers are seeing significant PPA improvements, he said. In one of the customer use cases for a high-level IoT product he cited, the customer requirements were easily achieved: cutting leakage in half, dynamic power consumption by roughly a third and area by 20%.
There’s so much technical detail on performance boosters in Laurent Grenouillet’s presentation, FD-SOI: a Low Power, High Performance Technology Scalable Down to 10nm, you really just have to look at it yourself – click here to get it. A CMOS & Memory Integration Expert at Leti, he did a quick review of 28-22-14nm, then took a deep dive into the myriad of performance boosting options for 10nm, including impressive benchmarking regarding the effectiveness of mobility boosters on FD-SOI vs. FinFET.
Here are the boosters he detailed for 28-22-14nm:
Interestingly he noted that with each node, the thickness of the insulating BOX layer of the SOI wafer scales down, and as it does, back bias efficiency improves even more.
Here’s what he then covered for 10nm (and detailed with data packed in the 20 slides that followed):
FD-SOI is the sweet spot when you need lower power, lower cost, more sensing (analog), more comm (RF), more flexibility and more energy efficiency, he concluded – and he provided powerful data to back that up.
I-fuseTM: the best OTP of Choice for FD-SOI and sub-14nm nodes was the topic of a talk by Attopsemi Technology’s Chairman, Shine Chung (you can get the ppt here). The company recently joined GF’s FDXcelerator partner program. OTP stands for one-time programmable memory, and I-fuse is different from other OTP technologies (notably NVM and e-fuses), he explained, in that it’s a non-breaking fuse with ultra-high reliability even in high-temp conditions. It’s been qualified by companies worldwide and is in volume production.
He’s a big fan of FD-SOI because it offers the best RF integration, small form factor, ULP and low cost. Want to make a cellphone as small as a watch? Then you need FD-SOI, he quipped with a tip of the hat to a Dick Tracy image. The fact that FD-SOI has a lower junction breakdown than bulk makes I-fuse the best choice for it, he said. You just program a gate as a fuse.
During breaks (on both days!), everybody was talking about the terrific Product Design Methodology presentation by Christophe Tretz, the SOI Consortium’s design guru (and longtime IBM guy). In fact, Christophe has agreed to write it up for ASN in the weeks to come, so don’t miss that. You’ll want to look at the whole presentation — click here to get it. In the meantime, here are some highlights.
He suggests designers consider an incremental approach in which FD-SOI benefits accrue. “No, you don’t have to know everything about the technology to use it,” he began (especially addressing those in smaller design teams and houses). “The ecosystem is there. Everything you need to use it is there.”
He used a number of cases to explain.
Case 1: a simple, digital SOC – you get significant power savings just by reusing existing library blocks and doing minor recompile.
Case 2: RF/mixed-signal – turnaround time is very fast (Analog Bits, for example cut leakage by 5x in a port that took just three months). FD-SOI gives analog designers a great new thing to play with for big power savings – and they learn fast.
Case 3 (= Cases 1 + 2): “complex” SOC with RF blocks – rework the RF blocks, but reuse library elements for the digital part without a lot of design effort. You get significant power savings very easily.
Case 4: a more complex SOC – in this case, you optimize or customize a few blocks in the first design pass, but then optimize/customize more blocks in subsequent design passes. It just keeps getting better and better.
Case X: a fully optimized SOC. This takes more time, but you can do parts in parallel and get dramatic results – especially if you use body biasing.
He then looked at the state of the ecosystem:
three fabs are ready
we have the tools (Synopsys, Cadence, Silvaco)
the libraries are there and ready to use
“You don’t have to learn everything to get your product out the door,” he concluded. “You don’t have to do it all at once: you can do it incrementally. Within a few months, you’ll have a nice product, and as you do new products every six months, each time you can re-use, but also tune for more improvements.”
In short: just do it!
So that’s a recap of Day 1. Next post (or posts?) I’ll recap Day 2. Stay tuned!
Registration is open for GlobalFoundries’ technical webinar, “How to Implement an ARM Cortex-A17 Processor in 22FDX 22nm FD-SOI Technology” (click here to go to the registration page). The webinar will cover the optimal steps to successfully implement ARM® Cortex®-A Series* processors using 22FDXTM 22nm FD-SOI technology.
GF Design Enablement Fellow Dr. Joerg Winkler will address:
This webinar will take place April 26, 2016 at10:00 am Pacific Time.
BTW, GF’s already done quite a few 22FDX-related webinars and videos – click here to see the current list.
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* Per ARM, “Cortex-A processors are specifically designed to execute complex functions and applications such as those required by consumer devices like smartphones and tablets. Their performance efficiency is also making them an increasingly popular choice for servers and enterprise applications where large core clusters can be combined for optimal solutions.”
Mentor Graphics is collaborating with GlobalFoundries on 22nm FD-SOI to qualify the Mentor® RTL to GDS platform for the current version of GlobalFoundries 22FDX™ platform reference flow. (Read the press release here.) This includes including Mentor’s RealTime Designer™ physical RTL synthesis solution and Olympus-SoC™ place & route system. In addition, Mentor and GF are working on the development of the Process Design Kit (PDK) for the 22FDX platform. The PDK includes support for the Mentor Calibre® platform, covering design rule checking (DRC), layout vs. schematic (LVS) and metal fill solutions for 22FDX. These solutions help mutual customers optimize their designs using the capability of 22FDX technology to manage the power, performance and leakage.
“We are collaborating closely with Mentor Graphics on enabling their products to help customers realize the benefits of the 22FDX platform,” said Pankaj Mayor, vice president of Business Development for GlobalFoundries. “The qualification of Mentor tools for implementation flows and design verification will help designers to achieve an optimal balance between power, performance and cost.”
The next release of the 22FDX PDK will put GF’s differentiated DFM capabilities into the hands of designers, says a Mentor spokesperson, ensuring delivery of high-quality designs and ensuring faster ramps to production.
ASN spoke with Kelvin Low, senior director of marketing for Samsung Foundry and Axel Fischer, director of Samsung System LSI business in Europe about the company’s FD-SOI offering. Here in part 1, we’ll talk about technology readiness. In parts 2 and 3, we’ll talk about design and the ecosystem.
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ASN: Where does Samsung stand in terms of rolling out your 28nm FD-SOI offer?
Kelvin Low: We have completed key milestones. Wafer level qualification was completed in September 2014, and then product level qualification in March 2015. So, the good news is the technology is fully qualified now.
What we have additionally in terms of overall technology readiness is production PDKs available right now. We have run a couple of MPWs already, and we’re scheduling more for next year. Silicon is really running in our fab. I think many may not have grasped that fact. Silicon is running, and we are running production for ST as one of our lead customers.
Axel Fischer: We already have a long relationship with ST – since 32 and 28nm HKMG bulk. We had a press release where we stated that more than a dozen projects had been taped out. EETimes published an article at the time. Adding 28 FD-SOI was a natural extension of an existing relationship
KL: That’s right –This is not a new customer scenario – it’s an existing customer, but an expansion of technology. And, in this case, it’s also a collaboration technology and IP solutions.
We are ST Micro’s primary manufacturing partner; this is one reason that it’s mutually beneficial for both of us. Crolles is not aiming for high volume. They prototype well. They do MPW and IP well, but they are not a high-volume fab. So, we complete the production rollout at Samsung Foundry.
ASN: Do you have other customers lined up?
KL: The short answer is yes. Beyond ST, Freescale can we talk about, since they have openly stated that they are using FD-SOI with us. Other customers, unfortunately, we just can’t say.But, they are in all the market segments (especially IoT) where the cost and ultra-low power combination is a very powerful one.
ASN: What about technology readiness and maturity?
KL: We have a couple of different 28 variants: the LPP, the LPH with more than a million wafers shipped. And because of that, our D0 – defect density – is at a very mature level. 28FD-SOI, sharing almost 75% of the process modules of 28 bulk, allows us to go to a very steep D0 reduction curve. We are essentially leveraging what we already know from the 28 bulk production experience. Defect density is essentially the inverse of yield. So, the lower the D0, the higher the yield.
This slide [[see above]] show the similarities between our FD-SOI and our 28 HKMG bulk. You can see how more than 75% of bulk modules are reused. The BEOL is identical, so its 100% reused. On the FEOL, some areas require some minor tuning and some minor modification, but anything that is specific to FD-SOI is less than 5% that we have to update from the fab perspective. All the equipment can be reused in the fab. There may be a couple of pieces related to the FD-SOI process that need to be introduced.Other than that, the equipment is being reused and can depreciated,.which is essential for any business. We leverage another lifetime for the tools.
ASN: When will we see the first high-volume FD-SOI chips? Next year?
KL: It depends on what market segment. Consumer, yes, I fully agree, they can ramp very fast. But other segments like infrastructure, networking or automotive, they’ll take a longer time to just qualify products.
AF: It’s not just us. If our customer needs to prove that the product is compliant with certain standards, you have to go through test labs and so on, this can be a very lengthy process. Product can actually be ready, and we’re all waiting to produce, but they’re still waiting for reports and the software that’s goes on top – this can be a very long cycle.
KL: We’re already starting to support the production ramp for ST. They’ll be on the market very soon.
[[Editor’s note: ST has announced three set-top box chips on 28nm FD-SOI– you can read about them here.]]
KL: Everyone’s waiting for ChipWorks or TechInsights to cut away an end-product device that has FD-SOI. It’s just a matter of time.
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CEA-Leti has signed an agreement with Keysight Technologies (formerly the Agilent/HP test group), the industry-leading device-modeling software supplier, to adopt Leti’s UTSOI extraction flow methodology within Keysight’s device modeling solutions for high-volume SPICE model generation. (Read the press release here.)
“This collaboration between Leti and Keysight will strengthen the global FD-SOI ecosystem by providing an automatic extraction flow for building model cards associated with the Leti-UTSOI models, which are already available in all the major SPICE simulators,” said Marie Semeria, Leti’s CEO. “This professional, automatic extraction-flow solution will address designers’ needs as they weigh FD-SOI’s benefits over competing solutions for the 28nm technology node and below.”
Compact models of transistors and other elementary devices are used to predict the behavior of a design. As such, they are embedded in simulations like SPICE that designers run before actual manufacturing. Power optimization is of course a key component in SOC design. Automatic extraction helps ensure that the power intent specified by the designer in the simulated transistors will really match what will ultimately be seen in silicon.
The simulation of the Leti-UTSOI compact model, which is the first complete compact model dedicated to Ultra-Thin Body and Box and Independent Double Gate MOSFETs (aka FD-SOI), is currently available in Keysight’s modeling and simulation tools. This agreement expands the collaboration to include the extraction flow and will enable device-modeling engineers to efficiently create Leti-UTSOI model cards for use in Process Design Kits (PDKs).
Cadence has announced that its digital and signoff tools are now enabled for the current version of the GLOBALFOUNDRIES® 22FDX™ platform reference flow (see press release here). GF has qualified these tools for the 22FDX reference flow to provide customers with the design flexibility of software-controlled body bias to manage power, performance and leakage needed to create next-generation chips for mainstream mobile, IoT and consumer apps. In addition, the ARM® Cortex®-A17 processor was used to validate the implementation flow with the Cadence® Innovus™ Implementation System and Genus™ Synthesis Solution.
Cadence collaborated with GF on the development of the PDK for the 22FDX platform. The Cadence digital implementation tools support the capability of forward and reverse body bias (FBB/RBB) to optimize the performance/power tradeoffs, implant-aware and continuous diffusion-aware placement, tap insertion and body bias network connectivity according to high voltage rules. The digital implementation tools also support double-patterning aware parasitic extraction (PEX) and design for manufacturing (DFM).
“The 22FDX reference flow can enable customers to achieve real-time tradeoff between static power, dynamic power and performance to create innovative products,” said Pankaj Mayor, GF Biz Dev VP.