Join us! In partnership with our members, the SOI Consortium is co-organizing and participating in two key SOI events coming up in China over the next few weeks. On May 18th, we’ve put together an SOI Forum at the World Semiconductor Congress (WCS) in Nanjing. And on May 23rd & 24th, we’ve teamed up with our members SIMIT, Sitri and Leti for another in our series of SOI Academies, including an FD-SOI Training Day. (The last one this past winter was a terrific success – read about that here if you missed our coverage at the time.)
At WCS, the SOI Forum (sub-forum #8) is part of the afternoon Innovation Summit. We’ll cover the broader SOI ecosystem, including both RF-SOI and FD-SOI – from wafers to design through manufacturing. Presentations will be given by members of the SOI Consortium team, and by leaders from our membership, including Simgui, NXP, Incize, ST, IBM, Cadence and Xpeedic. Click here or scan the QR code for the full program and registration information.
Also at WCS, SOI Consortium member VeriSilicon will be participating in a morning session on AI and IoT Wireless Communications (sub-forum #4). They’ll be giving a presentation on their low-power Bluetooth design platform for GlobalFoundries 22FDX, and their CEO Wayne Dai will be moderating a round-table discussion. You can get more information on that (in Chinese only, tho) here, or follow VeriSilicon on WeChat.
The SOI Academy in Shanghai is an opportunity for experienced designers to gain solid expertise in FD-SOI. The event begins in the afternoon of May 23rd with a series of informative plenary talks by members of the SOI Consortium team, and by experts from our members Leti, Soitec, VeriSilicon, GlobalFoundries and NXP. The FD-SOI Training starts the next morning, on May 24th.. This is a hands-on event lead by top experts from Leti. The morning is devoted to digital design in FD-SOI, and the afternoon to RF design (including for 5G) in FD-SOI. Attendees will get a comprehensive understanding of design techniques for low-power chips leveraging the multiple benefits and flexibility of FD-SOI technology. Get more information here, or from the WeChat QR code.
We’ve got a busy schedule! To keep up to date with where we and our members will be promoting the SOI ecosystem, be sure to check our Events page regularly.
FD-SOI for RF and mmWave communications is a hot topic. In high-data rate communications like RF and millimeter-wave devices in particular, FD-SOI delivers high-performance with numerous unique advantages, making it most likely the fastest RF-CMOS technology on the market.
If you’d like to take a deep dive and learn more about it, Soitec and Incize are sponsoring a free, full-day workshop in Grenoble on April 4th, 2019. Click here for registration information. The workshop follows the day after the IEEE/EDS EuroSOI-ULIS conference there (you can read about the full conference in a previous ASN post).
This technical workshop will cover the FD-SOI technology platform with a focus on its compatibility with RF & mmWave communications. Attendees will hear from notable FD-SOI leaders and experts from leading industry and research institutions presenting updates on key developments and building blocks across the semiconductor value chain. Topics will include circuit design, device fundamentals, simulation and characterization of RF devices, test, CMOS technology and substrate technologies enabling FD-SOI. In addition, the workshop will include an overview about how FD-SOI technology is benefiting current and future end user applications.
Here’s the agenda:
Lots of great information came out of the two days of workshops in Japan recently organized by the SOI Consortium. Some of the presentations are now posted on the consortium website (get them here).
The first day (held in Yokohama and sponsored by Silvaco) focused on FD-SOI and RF-SOI design. The second day (held at U. Tokyo) focused on More than Moore (especially silicon photonics, MEMS & sensors), and the SOI manufacturing ecosystem.
The 1st day panel discussion was so interesting we’ll give it a post of its own, then follow up with round-ups of the presentations from both days.
The morning panel discussion on end-user deployment for FD and RF-SOI was moderated by SOI Consortium Executive Director Giorgio Cesana. GF’s CTO Subi Kengeri led off saying that that 2017 had been the year of FD-SOI adoption. Samsung Director Adam Lee noted that in the beginning nobody believed it would get traction, but now everybody does, and Samsung is commercializing it: chips coming out this year will ramp in volume in 2019.
VeriSilicon CEO Wayne Dai said he sees great potential in IoT, where the volumes are high but fragmented. In IoT, he said, you need RF, but you really only need very high performance about 20% of the time, which is a perfect fit for FD-SOI.
ST Director John Carey noted that ST’s been using FD-SOI since 2014. They’ve fabbed products for cryptocurrency and infrastructure. Now in their second and third generations of designing with it, they’ve got some big FD-SOI chips coming out next year with embedded memory and RF. He sees it being particularly successful in mmWave, automotive and IoT.
The conversation then shifted to RF-SOI. Mostofa Emam, CEO of Incize, explained that since RF-SOI is already in every smart phone, it’s in a different situation from FD-SOI. The emphasis here is now on adding more blocks. “RF is an art,” he said. “It takes an artist. You need talented artists and tools.” One of the biggest challenges for fabs that are newcomers is models – not just at the transistor level, but also at the substrate level. The big players have addressed this, but Incize is working to support more foundries with new, innovative approaches, and helping them develop robust PDKs. The industry needs more good RF designers as well as better RF design flow, he concluded.
Coming back to FD-SOI, Cesana asked about non-volatile memory (NVM). Samsung’s Lee said they’ve already got NVM options including eMRAM for 28nm, and customers are now requesting eMRAM PDKs for the next node (18FDS). ST’s Kengeri added eNVM is important for FD-SOI, especially since flash is not scaling. While there are lots of options, MRAM gives you all the value, and in FD-SOI it only adds three more mask steps, so cost savings are maintained.
With respect to local computing for AI with FD-SOI, everyone agreed on the importance of the edge. In addition to RF, FD-SOI gives you density even at 28nm, explained Carey. You can manually control power with back biasing, so you get something very flexible, especially for NB-IoT applications where the battery will have to last for 10 years. In fact Kengeri sees FD-SOI as enabling fog/edge computing.
The next question was about 5G: which applications would we be seeing first, and how does FD-SOI help? Lee said Samsung’s seeing it for apps up to 10GHz as well as mmWave. Customers are telling them they want FD-SOI for technical reasons.
Kengeri expanded on that point, saying it comes down to fundamental physics: gate resistance, capacitance, mismatch. FD-SOI has lower Vmin and better Fmax compared to FinFETs, and that’s what tier-one players want.
Carey brought it back to RF-SOI (noting that ST’s introducing a 45nm version), which supports a large number of elements and increased complexity with smaller power budgets. Emam then asked the foundry guys about mmWave. Substrates won’t be the bottleneck he said, so what’s the FD-SOI/mmWave roadmap? Kengeri responded that GF’s ready. Lee said Samsung is also ready, and you’d see it next year on handsets. Samsung has engaged with customers on 30GHz for the middle of next year, he added: it’s qualified. Carey said ST sees it first in consumer premises equipment that’s connected by satellite.
Cesana then asked about image sensor processors (ISPs), noting that analyst Handel Jones has said this is a big opportunity for FD-SOI. You can do 3D integration with sensors, but heat makes noise, so you need technology that decreases heat production and doesn’t give you hotspots (which would be visible in the image). Kengeri pointed to challenges in power density, thermal envelopes and the RTS (random telegraph noise signal). Although there are a lot of options, FD-SOI plays well for thermals and noise, so GF sees a good opportunity here. Dai added that the industry needs volume applications for FD-SOI, and ISPs need to bring more logic closer to the camera. And he concurred that you need FD-SOI for the thermals: it’s very important.
In closing, Dai noted that as a design house, “We walk on two legs: FinFETs and FD-SOI.” 28, 22, 18 and 12nm FD-SOI all enable differentiation. In particular, you need something between 20nm and 7nm: FD-SOI is here. Asked about Japan in particular, Dai said beyond automotive he saw lots of potential in ULP for AVR. Kengeri added that for any applications besides performance-at-any-cost, FD-SOI is the right enabler.
RF-SOI is in every smart phone out there, and with 5G, there are lots more applications on the horizon. If you’d like to learn more about designing in RF-SOI, there’s a great short course coming up the day before and in conjunction with the EuroSOI-ULIS Conference in Granada, Spain.
The title of this short course is RFSOI: from basics to practical use of wireless technology. Program and registration details can be found here. The course runs for the full day on Sunday, 18 March 2018.
The talks, which are being given by a stellar line-up of experts, include:
BTW, this year marks the 4th joint EUROSOI – ULIS Conference. The EuroSOI Conference, which has been ongoing for decades, is well paired with the ULtimate Integration on Silicon Conference. The joint conference provides an interactive forum for scientists and engineers working in the field of SOI technology and advanced nanoscale devices. One of the key objectives is to promote collaboration and partnership between different players from academia, research and industry. As such, it covers technical topics, industry trends and updates from pertinent European programs.
EuroSOI-ULIS will take place 19–21 March 2018 at the University of Granada in Spain. For information on the program and how to register, see the website. Following the conference, the papers will be available at the IEEE Xplore® digital library, and the best papers will be published in a special issue of Solid-State Electronics.
Now in its third year, the 2015 IEEE S3S Conference has evolved into the premier venue for sharing the latest and most important findings in the areas of process integration, advanced materials & materials processing, and device and circuit design for SOI, 3D and low-voltage microelectronics. World-class leading experts in their fields will come to this year’s S3S Conference to present, discuss and debate the most recent breakthroughs in their research.
This year’s program includes:
The conference also features several events tailored for socialization and peer-to-peer discussions, such as the welcome reception, the cookout and the interactive Poster & Reception Session which is a great place to meet new colleagues and learn and exchange insights on technical topics. Enjoy a light snack and a beverage of your choice while meandering around to meet and discuss technical issues with long-time colleagues and make connections with new and influential experts and decision makers in your field.
Take time to visit the local attractions of Sonoma County. Sonoma is well known for outdoor recreation, spas, golf, night life, shopping, culinary activities, arts and music and wineries. It is truly my pleasure to serve as the General Chair of the 2015 Conference. —Bruce Doris
Download the Advance Program
Find all the details about the conference on our website: s3sconference
Click here to go directly to the IEEE S3S Conference registration page.
Click here for hotel information. To be sure of getting a room at the special conference rate book before 18 September 2015.
The DoubleTree by Hilton Sonoma Wine Country, One Doubletree Drive, Rohnert Park, CA 94928
October 5th thru 8th, 2015
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