The Paul Scherrer Institute reports that they have achieved strained silicon nanowires with the highest strain ever

The Paul Scherrer Institute reports that they have achieved strained silicon nanowires with the highest strain ever

Strained silicon nanowires

(Graphics: Paul Scherrer Institut/ R. Minamisawa)

Starting on SOI, the Paul Scherrer Institute reports in Nature that they have achieved strained silicon nanowires with the highest strain ever (4.5% elastic strain).

The principle of the method used for achieving a high stress in silicon: Firstly, the forces act in all directions in the silicon layer. If small parts of the layer are then etched away to create a thin wire, the forces act along the wires so that a high stress is created within them.

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