Category Archive Companies

SOITEC and UCL boost the RF performance of SOI substrates
Posted date : Dec 4, 2013

Soitec and a team from UCL have been working together to identify the technological opportunities to further improve the high-frequency performan

SOI – 3D Integration – Subthreshold Microelectronics: Register now for the IEEE S3S!
Posted date : Sep 13, 2013

(Photo credit: 2013 Hyatt Regency Monterey Hotel and Spa) Last May, we already let you know about the IEEE S3S conference, founded upon

Peregrine’s UltraCMOS® Semiconductor Technology Platforms: A Rapid Advancement of Process & Manufacturing
Posted date : May 27, 2013

For more than 20 years, Silicon-on-Sapphire (SOS) technology—an advanced form of Silicon-on-Insulator (SOI) processing—has been used in semic

IEEE SOI Conference (Oct., Monterey) Expands, Extends Call for Papers
Posted date : May 17, 2013

IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference Hyatt Regency Monterey Hotel and Spa, Monterey, California October 7th

IBM: FinFET Isolation Considerations and Ramifications – Bulk vs. SOI
Posted date : Apr 18, 2013

Fully-depleted transistor technologies, both planar and fin-type, are now in the mainstream for product designs. One of the many interesting topi

The Transition to Fully Depleted
Posted date : Dec 12, 2012

The SOI Industry Consortium is actively engaged in supporting the industry’s transition to fully-depleted (FD) technologies. FD technologies o

IBM: Why Fin-on-Oxide (FOx/SOI) Is Well-Positioned to Deliver Optimal FinFET Value
Posted date : Nov 30, 2012

FinFET technology promises continued scaling of CMOS technology via the potential to reduce (deleterious) short- channel effects. Realization of

Which wafers for energy-efficient, fully-depleted transistor technologies?
Posted date : Nov 21, 2012

To drive the competitiveness of PCs, smartphones and other leading-edge devices, the electronics industry has relied for decades on the continued

IBS Study Concludes FD-SOI Most Cost-Effective Technology Choice at 28nm and 20nm
Posted date : Nov 9, 2012

In a recent study entitled Economic Impact of the Technology Choices at 28nm/20nm, International Business Strategies (IBS) has found that those c

Leti: Adding Strain to FD-SOI for 20nm and Beyond
Posted date : Apr 30, 2012

Work at Leti shows that strain is an effective booster for high-performance at future nodes. The outstanding electrostatic performance already r