Join us! In partnership with our members, the SOI Consortium is co-organizing and participating in two key SOI events coming up in China over the next few weeks. On May 18th, we’ve put together an SOI Forum at the World Semiconductor Congress (WCS) in Nanjing. And on May 23rd & 24th, we’ve teamed up with our members SIMIT, Sitri and Leti for another in our series of SOI Academies, including an FD-SOI Training Day. (The last one this past winter was a terrific success – read about that here if you missed our coverage at the time.)
At WCS, the SOI Forum (sub-forum #8) is part of the afternoon Innovation Summit. We’ll cover the broader SOI ecosystem, including both RF-SOI and FD-SOI – from wafers to design through manufacturing. Presentations will be given by members of the SOI Consortium team, and by leaders from our membership, including Simgui, NXP, Incize, ST, IBM, Cadence and Xpeedic. Click here or scan the QR code for the full program and registration information.
Also at WCS, SOI Consortium member VeriSilicon will be participating in a morning session on AI and IoT Wireless Communications (sub-forum #4). They’ll be giving a presentation on their low-power Bluetooth design platform for GlobalFoundries 22FDX, and their CEO Wayne Dai will be moderating a round-table discussion. You can get more information on that (in Chinese only, tho) here, or follow VeriSilicon on WeChat.
The SOI Academy in Shanghai is an opportunity for experienced designers to gain solid expertise in FD-SOI. The event begins in the afternoon of May 23rd with a series of informative plenary talks by members of the SOI Consortium team, and by experts from our members Leti, Soitec, VeriSilicon, GlobalFoundries and NXP. The FD-SOI Training starts the next morning, on May 24th.. This is a hands-on event lead by top experts from Leti. The morning is devoted to digital design in FD-SOI, and the afternoon to RF design (including for 5G) in FD-SOI. Attendees will get a comprehensive understanding of design techniques for low-power chips leveraging the multiple benefits and flexibility of FD-SOI technology. Get more information here, or from the WeChat QR code.
We’ve got a busy schedule! To keep up to date with where we and our members will be promoting the SOI ecosystem, be sure to check our Events page regularly.
Key takeaway #2: If you need a Goldilocks process node – where you’ll get just the right balance between active power, unit cost and investment – look to FD-SOI. And, btw, the IP landscape has improved dramatically. Those were just some of the great points made by Huibert Verhoeven (shown above), GM/SVP of Synaptics’ IoT Division in his talk at the recent SOI Symposium in Silicon Valley.
BTW, if you missed part 1 of our coverage —Silicon Valley SOI Symposium a Huge Success. Key Takeaways (Part 1) Here. – you’ll want to be sure to read it, too. Almost all of the presentations are now posted on our website – click here to access them.
In this post here, we’ll cover presentations by Synaptics, GlobalFoundries, STMicroelectronics, Anokiwave and Dolphin Integration. It was a really full, day, so be sure to stay turned for Part 3 of our coverage to follow shortly: it will highlight the remaining presentations and panel discussions.
Synaptics’ Verhoeven’s presentation Revolutionizing User Experience Through Secure Neural Network Acceleration at the Edge was about Smart Home and using SOI. Synaptics is a human interface (HMI) company that’s been doing neural networks since 1986. They’ve always been on the leading edge, from their first shipment of PC touchpads to becoming a dominant force in all things HMI today: they now ship over a billion units annually.
They currently have SOI products shipping with dedicated neural networks for voice, he said. European [privacy] regulations have played a part in driving their use of SOI, as have challenges regarding power and heat. Things are getting smarter at the edge. For example, not only do users want their coffee machine to offer the usual morning espresso, Synaptics says that the next step is for your coffee machine to recognize you’re looking extra tired and ask if you might want a double?!
For them Smart Home and multi-modal applications are the primary area of interest, as well as some automotive. Although their biggest customers have resources, others need guidance. Voice is a critical component, but now you also need video and display.
Why SOI? Their HMI vision requires low power, significant computation and dedicated neural network hardware, explained Verhoeven, so FD-SOI with RF meets their needs. “22nm SOI is a Goldilocks IoT Process Node,” he proclaimed. It gets the combination of active power, unit cost and investment just right. What’s more, he said, “The IP landscape has improved dramatically. Our choice of SOI was not an accident.” Be on the lookout for more products leveraging FD-SOI over the next six months, he concluded.
At this point on SOI, they’ve got 1 TOPS products with dedicated NPU for speakers, soundbars, Wi-Fi mesh, appliances, STBs and smart displays. These products have voice and sensor real-time (RT) AI. Next up is >4 TOPS on SOI with dedicated NPU, targeting STBs and smart displays with voice, video, imaging and RT AI.
“Our clients are at the forefront of changing the world,” declared Mark Granger, VP of the Automotive Product Line at GlobalFoundries. His presentation, Capturing High Growth Market Opportunities with SOI, detailed how mobility, automotive and IoT are the growth markets for SOI. So not unsurprisingly, GF’s 22nm FD-SOI technology, 22FDX, is seeing particular traction in mobile, edge, wearables and automotive.
They’ve got twice as many tape-outs this year as they did a year ago, he noted. GF’s SOI portfolio includes 22FDX®, 45RFSOI and 8SW/7SW RF SOI for 5G/mobility; 22FDX for automotive (fully qualified for automotive Grade 2, with Grade 1 on the way); and 22FDX, 130RFSOI and 8SW/7SW RF SOI for IoT.
GF has announced a stream of good news recently:
You might have heard about the Dolphin Integration news, as we covered it recently here at ASN (if not, be sure to read it here). Dolphin’s IP and methodology solutions address energy efficiency challenges. Automated transistor body biasing adjustment can achieve up to 7x energy efficiency with power supply as low as 0.4V on 22FDX designs. At the Silicon Valley event, Dolphin Integration CEO Philippe Berger provided additional information in his talk, FD-SOI IP Platform for Energy-Efficient IoT SoC.
In another GF-related talk, Nitin Jain, the CTO of longtime GF RF-SOI customer Anokiwave presented Unleashing the mmWave Phase Array Using SOI for 5G & Satcom. Anokiwave is a fabless semi IC company (you’ll find a good technical discussion of mmWave phase array written by their Chief Architect here). They do active antennas (aka phased array), something the military’s done for a long time, but now Anokiwave is bringing it to new markets and applications including radar, satcom and 5G. What they’ve been able to do is planarize the active antennas. They use GF’s 45RFSOI process technology for phased array systems because of the cost, performance, scalability and system enhancements it enables. 45RFSOI, he explained, is ideal for beam-forming FEMs (including the switches, LNAs and PAs). The move to 5G/mmWave is going to require a lot of antennas, so these Anokiwave ICs are headed to high volumes, concluded Jain.
As Roger Forchhammer, Director of Business Development at STMicroelectronics pointed out in his presentation, Automotive FD-SOI Microcontrollers with Embedded PCM, ST pioneered FD-SOI (and that was almost a decade ago, btw). Then in February 2019, they announced a world first: they’d begun sampling 28nm FD-SOI microcontrollers (MCUs) with embedded non-volatile memory (eNVM) based on embedded Phase-Change Memory (ePCM) to 10 alpha customers. These MCUs target powertrain systems, advanced and secure gateways, safety/ADAS applications, and vehicle electrification.
(In case you want technical details, the breakthrough ePCM eNVM was first presented at IEDM in December 2018 – you can get the presentation that accompanied the paper, Truly Innovative 28nm FDSOI Technology for Automotive Microcontroller Applications embedding 16MB Phase Change Memory, from the ST website.)
In his Silicon Valley presentation, Forchhammer said they’re now doing Stellar, a whole family of automotive products on FD-SOI. To do it, they’d taken an existing device and moved it to 28nm FD-SOI with ePCM, which they manufacture at their fab in Crolles, France. A major advantage for automotive he cites is that in software updates it’s bit-level programmable. “ST is fully behind FD-SOI,” he concluded, adding that we’re see more automotive as well as IoT products coming soon.
Well folks, that’s all for this post. We’ll finish up our coverage of the SOI Consortium’s 2019 Silicon Valley Symposium in the next ASN post (there was so much to cover!). So please stay tuned.
Two of the big, recent breakthroughs in memory technology – eMRAM and ePCM – have gotten their start in volume manufacturing on 28nm FD-SOI. In conjunction with the 2019 IEEE International Memory Workshop, SOI Consortium members Leti and Applied Materials have teamed up to give a technical program to explore short-term and long-term memory solutions. While the workshop is not specific to SOI, given the recent foundry announcements about ePCM and eMRAM for FD-SOI, the organizers predict it will be of particular interest to those following the greater SOI ecosystem. The event takes place at the end of the Sunday IMW tutorial day, starting at 5:30pm at the Hyatt Regency in Monterey, CA. Please see this page for the program and registration information.
Here is the program:
Jean-Eric Michallet, Head of Leti’s Microelectronics Components Department, Silicon Component Division is one of the organizers. Here is his overview:
FD-SOI is expected to be a long-lived technology. It enables planar CMOS scaling and accommodates a great deal of More-than-Moore developments where its ability for low power and great analog performance can make a difference for IoT, Automotive, Machine Learning or 5G applications. But to do this it requires a high-performance and cost-effective non-volatile embedded memory option. The incumbent Flash cell is reaching the end of its roadmap due to the difficulty of shrinking the bitcell and manufacturing, as well as the finished wafer cost increase. Back-end integrated Random Access Memory in advanced CMOS process has been explored for many years now as a competitive solution for fast-write and low-voltage non-volatile embedded memories. Foundry availability of embedded Magnetic RAM and Phase Change RAM for FDSOI 28nm platforms has been announced recently, showing that these technologies have now reached industrial maturity. CEA-Leti and Applied Materials invite you to attend a technical program to explore short-term and long-term memory solutions, from early research to industrialization.
Registration is open, free, and available to all IMW attendees, and others. However, as seating is limited and as we have already several participants pre-registered, registration is by invitation only and early registration is recommended. If you are interested, please email Jean-Eric Michallet.
The event is presented in conjunction with the 2019 IEEE International Memory Workshop, to be held on Sunday, May 12th, 2019, Hyatt Regency, Monterey CA, starting at 5:30 pm.
FD-SOI for RF and mmWave communications is a hot topic. In high-data rate communications like RF and millimeter-wave devices in particular, FD-SOI delivers high-performance with numerous unique advantages, making it most likely the fastest RF-CMOS technology on the market.
If you’d like to take a deep dive and learn more about it, Soitec and Incize are sponsoring a free, full-day workshop in Grenoble on April 4th, 2019. Click here for registration information. The workshop follows the day after the IEEE/EDS EuroSOI-ULIS conference there (you can read about the full conference in a previous ASN post).
This technical workshop will cover the FD-SOI technology platform with a focus on its compatibility with RF & mmWave communications. Attendees will hear from notable FD-SOI leaders and experts from leading industry and research institutions presenting updates on key developments and building blocks across the semiconductor value chain. Topics will include circuit design, device fundamentals, simulation and characterization of RF devices, test, CMOS technology and substrate technologies enabling FD-SOI. In addition, the workshop will include an overview about how FD-SOI technology is benefiting current and future end user applications.
Here’s the agenda:
GlobalFoundries and Dolphin Integration are collaborating on the development of a series of adaptive body bias (ABB) solutions to improve the energy efficiency and reliability of SoCs on GF’s 22nm FD-SOI (22FDX®) process technology for a wide range of high-growth applications such as 5G, IoT and automotive. The goal of the IP is to accelerate energy-efficient SoC designs and push the boundaries of single-chip integration. The design kits with turnkey ABB solutions will be available starting in Q2 2019.
As part of the collaboration, Dolphin and GF are working together to develop a series of off-the-shelf ABB solutions for accelerating and easing body bias* implementation on SoC designs. ABB is a unique feature of FD-SOI that enables designers to leverage forward and reverse body bias techniques to dynamically compensate for process, supply voltage, temperature (PVT) variations and aging effects to achieve additional performance, power, area and cost improvements beyond those from scaling alone.
The ABB solutions in development by GF and Dolphin consist of self-contained IPs embedding the body bias voltage regulation, PVT and aging monitors and control loop as well as complete design methodologies to fully leverage the benefits of corner tightening. GF says its 22FDX technology offers the industry’s lowest static and dynamic power consumption. With automated transistor body biasing adjustment, Dolphin Integration can achieve up to 7x energy efficiency with power supply as low as 0.4V on 22FDX designs.
“We have been working with GF for more than two years on advanced and configurable power management IPs for low power and energy efficient applications,” said Philippe Berger, CEO of Dolphin Integration. “Through our ongoing collaboration with GF, we are focused on creating turnkey IP solutions that allow designers to realize the full benefit of FD-SOI for any SoC design in 22FDX.”
“In order to simplify our client designs and shorten their time-to-market, GF and our ecosystem partners are helping to pave the way to future performance standards in 5G, IoT and automotive,” said Mark Ireland, vice president of ecosystem partnerships at GF. “With the support of silicon IP providers like Dolphin Integration, new power, performance and reliability design infrastructures will be available to customers to fully leverage the benefits of GF’s 22FDX technology.”
As STMicroelectronics Fellow and Professor Andreia Cathelin has beautifully noted, “Body biasing is not an obligation. It’s an opportunity.” And GF/Dolphin clearly aim to make that opportunity a much easier and more powerful one to take advantage of.
~ ~ ~
*A note on terminology: the terms back bias and body bias are used interchangeably. Likewise the terms adaptive and dynamic when used in the FD-SOI context. Here is a quick explanation of how it works, from an ST paper from several years ago:
Back-biasing consists of applying a voltage just under the BOX of target transistors. Doing so changes the electrostatic control of the transistors and shifts their threshold voltage VT, to either get more drive current (hence higher performance) at the expense of increased leakage current (forward back-bias, FBB) or cut leakage current at the expense of reduced performance. While back-bias in planar FD is somewhat similar to body-bias that can be implemented in bulk CMOS technology, it offers a number of key advantages in terms of level and efficiency of the bias that can be applied. Back-biasing can be utilized in a dynamic way, on a block-by-block basis. It can be used to boost performance during the limited periods of time when maximum peak performance is required from that block. It can also be used to cut leakage during the periods of time when limited performance is not an issue. In other words, back-bias offers a new and efficient knob on the speed/power trade-off.
For another good discussion of body biasing in FD-SOI, you might want to check out The Return Of Body Biasing by Semiconductor Engineering’s Ann Steffora Mutschler from a couple years ago.
Following the immense success of last year‘s FD-SOI training day in Silicon Valley, the SOI Consortium has another one planned for the end of April this year. If you want to start learning how to leverage FD-SOI in your chip designs, this is a great place to start. Click here for information on how to sign up.
ST Fellow Dr. Andreia Cathelin has put together another great line-up. World renowned professors and experts from industry will deliver a series of four training sections of 1.5 hours each, focused on energy efficient and low-power, low-voltage design techniques for analog, RF, high-speed, mmW and mixed-signal design.
You’ll learn about design techniques that take full advantage of the unique features of FD-SOI, including body biasing capabilities that further enhance the excellent analog/RF performances of these devices.
Each section of this training day will take you through concrete design examples that illustrate new implementation techniques enabled by FD-SOI technologies at the 28nm and 22nm nodes – and beyond.
The design examples will cover basic building blocks through SoC implementations. A global Q&A session will close the day.
Here’s a little more info on how the day will unfold. Click on the slides to see them in full screen.
FDSOI-specific design techniques for analog, RF and mmW applications – Andreia Cathelin, Fellow, STMicroelectronics
Andreia Cathelin is ST’s key design scientist for all advanced CMOS technologies, and is arguably the world’s leading expert on leveraging FD-SOI in high-performance, low-power RF/AMS SoCs. Her course will first present a very short overview of the major analog and RF technology features of 28nm FDSOI technology. Then the focus moves to the benefits of FD-SOI technology for analog/RF and millimeter-wave circuits. She’ll give design examples such as analog low-pass filters, inverter-based analog amplifiers and 30GHz and 60GHz Power Amplifiers, as well as mmW oscillators. There will be particular focus on the advantages of body biasing and special design techniques offering state-of-the-art performance.
Circuit Design Techniques in 22nm FD-SOI for 5G 28GHz Applications – Frank Zhang, Principal Member of Technical Staff, GlobalFoundries
Frank Zhang has designed chips using GF’s 22nm FD-SOI (22FDX) process for WLAN, 5G cellular and automotive radar applications. His course will focus on how to take advantages of FD-SOI’s high-frequency performance at relatively low-current density to design high performance RF/mmWave circuits. Examples circuits include a 28GHz LNA, a 28GHz PA and an RF switch for 5G applications. The FD-SOI advantages such as low capacitance, high breakdown voltage and high-output impedance will be exploited in these design examples. This course will also discuss how to extend these techniques to applications at higher frequencies and/or higher current densities that are subject to extreme temperatures and EM requirements.
Energy-Efficient Design in FDSOI – Bora Nikolic, Professor, UC Berkeley
Borivoje (“Bora”) Nikolić is known as one of the world’s top experts in body-biasing for digital logic (he and his team have designed more than ten chips in ST’s 28nm FD-SOI.) If you missed it, his team’s RISC-V chip was cited as one of Dr. Cathelin’s “Outstanding 28nm FD-SOI Chips Taped Out Through CMP” – read more about that here. His talk at the training day will present options for energy-efficient mixed-signal and digital design in FD-SOI technologies. He’ll explain how to generate body bias and use it to improve efficiency, with examples in RF and baseband building blocks, temperature sensors, data converters and voltage regulators. The techniques will be presented in the context of UC Berkeley’s latest RISC-V-based SoC, designed to operate in a very wide voltage range using 28nm FD-SOI.
mm-Wave and Fiber-Optics Design in FD-SOI CMOS Technologies – Sorin Voinigescu, Professor, University of Toronto
Sorin Voinigescu is a world renowned expert on millimeter-wave and 100+Gb/s ICs and atomic-scale semiconductor device technologies. His lecture will cover the main features of FD-SOI CMOS technology and how to efficiently use its unique features and suitable circuit topologies for mm-wave and broadband SoCs. He’ll begin with an overview of the impact of the back-gate bias and temperature on the measured I-V, transconductance, fT, and fMAX characteristics. Then he’ll compare the maximum available gain, MAG, of FDSOI MOSFETs with those of planar bulk CMOS and SiGe BiCMOS transistors through measurements up to 325 GHz. Next, he’ll provide biasing, sizing and step-by-step design examples for VCO, doubler, switches, PA, large swing optical modulator drivers and quasi-CML circuit topologies and layouts that make efficient use of the back-gate bias to overcome the limitations associated with the low breakdown voltage of 20nm and 12nm FD-SOI CMOS technologies.
With over 100 attendees filling every chair in the auditorium, last year’s training day was sold out. Although it was in Silicon Valley, people actually flew in from all over the world to be there. During the Q&A at the end, most everyone prefaced their questions by saying, “Thank you. I really learned a lot today.”
2018 will be no different – except that it’s sure to sell out even faster. Please note, though, that this is not a free event, so only the attendees will get copies of the slide decks.
Here’s key info you need to sign up. See you there!
When: 27 April 2018, 7:30am – 5pm.
Where: Crowne Plaza San Jose, Milpitas CA (parking is free)
Registration fee: US $485.00 (includes training book, breakfast, box lunch and refreshments during breaks)
How to sign up: Click here to go directly to the registration site.
This is the second part of ASN coverage of Day 2 of the recent SOI Workshop in Tokyo, which was dedicated to the “Convergence of IoT, Automotive through Connectivity”. Many of the presentations are now posted and freely available – click here to see the full list.
Peter Rabbeni, GlobalFoundries’ Sr. Director of 5G BizDev and Product Line Marketing focused on mmWave and why/how 5G. In his talk, Delivering on the Promise of 5G: Semiconductor Solutions for the Next Wave of Data, he pointed out that there’s not one solution for all use cases – but there is an SOI solution for all the opportunities.
You need mmWave for latency, simultaneous connectivity, energy-efficiency and mobility, he explained. mmWave addresses the trade-off between distance and data rates. In a phase array, the beam is steered, but because of atmospheric absorption, you have to do multiple beams at high frequencies.
RF-SOI technology is already found in virtually every smartphone in the world. Now, he sees two main benefits in RF-SOI (a partially depleted technology that uses “trap-rich” substrates, btw) in the move to 5G and mmWave. One is device stacking, which you can do in SOI to overcome the Johnson Limit (a tradeoff between breakdown voltage and frequency). The other comes from the benefits inherent in the substrate: high-resistivity, high-Q and isolation. It means you can have smaller arrays for each element, and fewer chips per array. That’s key: you need those smaller arrays for handsets and customer premises equipment.
Different designers are taking different approaches to RF, he notes. There are those doing FEM-centric designs, which integrate from the antenna back toward the transceiver. And then there are those that are doing integration-centric designs, which target integration from the transceiver/BB toward the antenna. The first approach is being driven by those customers with unique IP and presence in the front-end module space. The other is being driven by folks with IP and presence in the SOC space. Both will exist in some form, he contends. 45RFSOI is well aligned with the first case and focused primarily with FEM leadership performance and integration. 22FDX, on the other hand, is very well suited for transceiver/baseband ADC/DAC integration and can integrate the FEM functionality as well. Pathfinding on the FEM integration component is on-going for 22FDX.
SOI is “…the perfect solution to our needs”, said Steven Yeung, Design Manager with MIPS/Imagination Technologies in his talk, MIPS Leading Heterogenous Compute in Automotive & IP. The cost of failure is increasing he noted, citing the ISO standard 26262 for functional safety in road vehicles, and SOI “helps a lot”.
As noted in the presentation title, research powerhouse Leti sees that the Future of the Automotive Industry is Paved With SOI. Vincent Roger of Leti’s Corporate Business Development made convincing arguments as to why FD-SOI is the right solution for automotive:
you need advanced digital circuitry for all computational tasks in the automotive environment
the 3-generation node gap between automotive and consumer is closing
FD-SOI is more power efficient than planar bulk (both at 28 and 22nm) or FinFET (16nm)
it’s simpler in terms of design and IP portability than FinFET
it’s a proven solution, with better reliability and lower design costs
it addresses all performance levels and communications
it simplifies integration of control electronics for distributed sensors
Leti is actively working on getting RF capabilities in FD-SOI adopted more quickly. For example, they are developing RF models for their UTSOI-2 modeling suite for FDSOI, including back bias effects. And they’re also developing innovative basic design blocks that prove the technology validity and add new functionality.
He also sees an even bigger role for RF-SOI, the technology of choice for RF Front End Modules for connected vehicles and 5G applications. With Soitec, they’re working to keep improving existing substrates and introduce new concepts.
SOI wafer suppliers (Soitec, SEH and Simgui) are expanding capacity, said Soitec EVP Thomas Pilisczcuk. His talk, The Role of Substrates in Accelerating Mass Adoption of SOI Technologies, reviewed the various SOI substrates and partners across FD-SOI, RF-SOI, photonics, power, image sensors and more.
Soitec is launching a program called FIRST (for First Integration Ramp of SOI Toolbox) to help customers reach competitive yields fast. They are also help customers facilitate SOI integration into design and manufacturing.
There are still more talks that are now posted on the SOI Consortium website. IHS/Markit made a very interesting high-level presentation on LIDARs & Sensor Fusion ECUs Advancing ADAS Architectures Toward Automated Driving, which called for chipmakers to integrate more features. Nokia Future X Network for 5G & IoT looked at infrastructure (they use their own chipsets). ST looked at smart cities in Sensor-to-Cloud Connectivity for IoT.
Equipment makers are also eager participants in the FD-SOI ecosystem. Screen’s presentation was entitled Full Participation Within the SOI Consortium. The Applied Materials talk, Enabling SOI and IoT: An Equipment and Materials Engineering Perspective, covered how they’re working with their customers and their customers’ customers to understand the trends and enable the device roadmap.
Mark your calendars: the next workshop sponsored by the SOI Consortium will be in Shanghai this September 26th and 27th (one day is all about FD-SOI, the other about RF-SOI). You can now register or ask for an invitation: see Events on the SOI Consortium website. Last year’s Shanghai event was really dynamic and absolutely packed, so you’ll want to make sure you register early. (But if you can’t make it, you can of course read about later it in ASN!)
Looking for insight into the state of SOI and FD-SOI in Japan? Want to find out who’s doing IP and design support? Wondering about the major drivers? If you’re in the region, you can find out – and network with the top players in the ecosystem – at the 3rd Annual SOI Tokyo Workshop. The SOI Consortium has put together a great line-up of speakers.
This year it will take place over the course of two days, May 31st and June 1st . Click here for registration information on the SOI Consortium website. (While there is no charge for the event, please register in advance to guarantee your place.) You’ll find the full program here. A brief summary follows.
The first day – Wednesday, May 31st – is an afternoon session hosted by Silvaco, with presentations from some of the key players in the FD-SOI Ecosystem. Speakers include top executives from GlobalFoundries and IP/design leaders Synopsys, Silvaco, Invecas and Attopsemi, as well as the SOI Consortium.
It will take place on the 25th floor of the Yokohama Landmark Tower. The reception at the end of the day will give participants an extended opportunity to network with the speakers and other attendees.
The second day of the workshop – Thursday, June 1st – will focus on Convergence of IoT, Automotive Through Connectivity. This full-day workshop, with talks by top executives in the industry, will be held at Tokyo University’s Takeda Hall.
It kicks off with talks on ultra-low power applications from Sony IoT and Samsung. Next up, speakers from Imagination/MIPS, IHSMarkit and Leti address automotive technologies. After lunch, the first group of speakers from GlobalFoundries, Cadence, Nokia and ST tackle IoT, Connectivity and Infrastructure. The day wraps up with talks by some of the key supply chain providers: Applied Materials, Soitec and Screen.
Coffee breaks and lunch will give attendees and speakers time for further discussion.
This is a great opportunity – don’t miss it!