Although the basic principles of Silicon-On- Insulator (SOI) technology are simple, the ramifications are far reaching. The use of SOI reduces pa
Ongoing since 2002, the MEDEA+ T206 CMOS SOI project is scheduled to finish up this September.
The objective is: “...to evaluate,
In January of this year, Soitec announced its participation as the SOI substrate supplier in an ATDF devel
Now in its third year, Soitec’s Characterization Lab in Bernin proposes a whole battery of electr
A preliminary public version of the “EUROSOI State of the Art Report” is now available at www.eurosoi.org. It compiles the contributions of m
SOI pioneer Jerry G. Fossum has received the most recent J.J. Ebers award, “For outstanding contributions to the advancement of SOI CMOS device
A new book, SOI Device Technology by Makoto Yoshimi, PhD, covers the history of SOI, the floating body effect and a variety of LSI applications.
Here’s a quick review of some recent Smart Cut activity.
March 2005 - WORLD’S FIRST GALLIUM NITRIDE (GaN)-ON- IN
While microelectronics relies on SOI for its insulating layer, SOI-MEMS benefits from the single crystal silicon of the top layer and substrate.
• High Growth Projected for GaN
According to a recent report in “SST” magazine, the Silicon Valley-based market research firm Strategies U
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